Quantum Dot Materials

High-quality SWIR quantum dot materials for thin-film focal plane array (FPA) fabrication, featuring tunable absorption and exceptional chemical stability.

Overview

Optimized for large-area thin-film deposition techniques—including spin coating, blade coating, and printing—our CQD materials ensure high uniformity and consistent batch-to-batch performance.

Key Features

Solution-processable CQDs with precise size and tunable spectral properties
High uniformity across large-area thin-film deposition
Stable optical and electrical characteristics with consistent batch-to-batch performance
Compatible with standard coating and printing processes

Applications

R&D of CQD–Based Optoelectronic Devices
Fabrication of Thin-Film FPA Detectors
Material Evaluation and Process Optimization

Product Specifications

Model P/N	Absorption Peak (nm)	Particle Size (nm)	Ligand Type	Ligand Concentration (mg/mL)	FWHM (nm)	Peak-to-Valley Ratio	Stokes Shift (nm)	Product Form
PbS-800	800±5nm	~2.9nm	Oleic acid	40-50 wt%	≤120nm	≥1.5	~140nm	• Powder • Solution (n-Octane / n-Hexane / Toluene) Concentration Range: 10–50 mg/mL
PbS-940	940±5nm	~3.4nm	Oleic acid	35-45 wt%	≤120nm	≥3	~120nm
PbS-1100	1100±10nm	~4.0nm	Oleic acid	30-40 wt%	≤120nm	≥4	~100nm
PbS-1300	1300±10nm	~4.8nm	Oleic acid	30-40 wt%	≤120nm	≥6	~80nm
PbS-1500	1500±10nm	~6.0nm	Oleic acid	25-35 wt%	≤120nm	≥6	~50nm
PbS-1700	1700±15nm	~6.9nm	Oleic acid	20-30 wt%	≤150nm	≥5	~10nm
PbS-1900	1900±30nm	~8.1nm	Oleic acid	15-25 wt%	≤200nm	≥5	~10nm
PbS-2000	2000±50nm	~9.1nm	Oleic acid	15-25 wt%	≤200nm	≥1.5	N/A
PbS-2200	2200±50nm	~11.5nm	Oleic acid	15-25 wt%	≤200nm	/	N/A